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{{name}}: {{value}}
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{{/each}}
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{{#if product.featureValues}}{{product.productPrice.formattedPrice}} {{#if product.productPrice.priceType === "PRICE_RANGE" }} - {{product.productPrice.formattedPriceMax}} {{/if}}
{{#each product.specData:i}}
{{name}}: {{value}}
{{#i!=(product.specData.length-1)}}
{{/end}}
{{/each}}
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AlO+SiN Thin-film Deposition. • Atomic layer deposition process, with better film uniformity. • Multi-layer thin film deposited in the same process equipment or same furnace tube, reducing process ...
... depositing an Al2O3 thin film on the front surface of the wafer of a crystalline solar cell by the thermal Atomic Layer Deposition (ALD) to form a passivation layer. Spec High Throughput: 12,800 ...
... Ideal for laboratory tests and industrial production of small pieces Perfectly suited for 3D complex-shaped components ALD deposition of Al2O3 and TiO2 Remote plasma source Gas panel with 4 heated ...
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