{{product.productLabel}} {{product.model}}
{{#if product.featureValues}}{{product.productPrice.formattedPrice}} {{#if product.productPrice.priceType === "PRICE_RANGE" }} - {{product.productPrice.formattedPriceMax}} {{/if}}
{{#each product.specData:i}}
{{name}}: {{value}}
{{#i!=(product.specData.length-1)}}
{{/end}}
{{/each}}
{{{product.idpText}}}
{{product.productLabel}} {{product.model}}
{{#if product.featureValues}}{{product.productPrice.formattedPrice}} {{#if product.productPrice.priceType === "PRICE_RANGE" }} - {{product.productPrice.formattedPriceMax}} {{/if}}
{{#each product.specData:i}}
{{name}}: {{value}}
{{#i!=(product.specData.length-1)}}
{{/end}}
{{/each}}
{{{product.idpText}}}
... 200 Mask Aligner is a cost-effective high performance mask Aligner that has been engineered with industry proven components that have made OAI a leader in the photolithography ...
OAI
... for parallel photo mask alignment and uniform contact across the wafer during contact exposure. The Model 200IR Mask Aligner is capable of one micron resolution and alignment precision. ...
OAI
... Model 800 Series Mask Aligners are versatile optical 2 camera front side mask aligners or 4 camera backside mask aligners that deliver ...
OAI
... Seriesl 6000 can be integrated seamlessly with cluster tools. OAI's new production mask Aligners are the total package. HIGHLY OPTIMIZED YIELDS 200 WPH in 1st Mask Mode Advanced Beam ...
OAI
The EVG®610 is a compact and multi-purpose R&D system that can handle small substrate pieces and wafers up to 200 mm. The EVG610 supports a variety of standard lithography processes, such as vacuum-, hard-, soft-, and proximity exposure ...
EV Group
The EVG®620 NT provides state-of-the art mask alignment technology on a minimized footprint area up to 150 mm wafer size. Known for its versatility and reliability, the EVG620 NT provides state-of-the-art mask ...
EV Group
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