{{product.productLabel}} {{product.model}}
{{#if product.featureValues}}{{product.productPrice.formattedPrice}} {{#if product.productPrice.priceType === "PRICE_RANGE" }} - {{product.productPrice.formattedPriceMax}} {{/if}}
{{#each product.specData:i}}
{{name}}: {{value}}
{{#i!=(product.specData.length-1)}}
{{/end}}
{{/each}}
{{{product.idpText}}}
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{{#if product.featureValues}}{{product.productPrice.formattedPrice}} {{#if product.productPrice.priceType === "PRICE_RANGE" }} - {{product.productPrice.formattedPriceMax}} {{/if}}
{{#each product.specData:i}}
{{name}}: {{value}}
{{#i!=(product.specData.length-1)}}
{{/end}}
{{/each}}
{{{product.idpText}}}
... The practical grit size range of particle is 0.1-10mm. Used for precision processing of ruby and sapphire; processing of silicon in IT field. Ra is less than 1nm; processing of precise ceramic, optical lens and fibre ...
Our silicon nanopowder has a controlled nanoscale size and high purity level. These properties provide an impressive capacity of electric charge. The Tekna silicon nanopowders can revolutionize forthcoming ...
... creep strength, medium density and tensile strength, and good temperature mechanical properties. The reaction of metal and silicon reduces the activity of the metal, so silicidation The chemical stability of the material ...
Hunan Huawei Jingcheng Material Technology Co.Ltd.
... epitaxial CoSi2 can be formed on a Si substrate /Si structure, used to study the interface characteristics of epitaxial metal silicon. Molecular weight:115.104 Density:4.9 g/cm3 Colour:gray Melting point:1326 °C Boiling ...
Hunan Huawei Jingcheng Material Technology Co.Ltd.
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