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The plasma source are incorporated into a vacuum chamber and generate high-density plasma. The plasma source can be used as Plasma Assisted ...
RF Atom Source for atomic oxygen and atomic nitrogen Minimized power losses due to optimized design Discharge zone is manufactured from high-quality materials ensuring a minimal contamination of the beam Zero-ion ...
The TruPlasma DC Series 3000 (G2) is suitable for a number of DC sputtering processes – including use as a replacement for pulsed process power supplies. This is because progressive arc management offers a guarantee for the best layer ...
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