Remote plasma source Xstream

The highly efficient Xstream® RPS dissociates large volumes of NF3 and quickly cleans chambers, improving your overall tool performance. Its plasma chamber showcases high-purity aluminum alloy and patented cooling capabilities. Built to last for years without repair or expensive chamber coatings, the Xstream RPS is the smart choice for dependability and efficient performance. • Highly reliable RPS maximizes tool uptime • Effective reactive species transportation to process chamber for improved performance • Transformer coupled plasma (TCP) source with integrated Active Match Network (AMN) • 225 kHz to 660 kHz operating frequency • 8 kW/10 kW power models • Eliminate expensive chamber coatings with custom aluminum alloy and Type III hard anodization • Improve chamber performance and durability via a cooling system that minimizes thermal stress • Increase efficiency and improve power delivery to the plasma with an Active Match Network • Precisely control power and processes thanks to real-time plasma measurements • Achieve reliable and reproducible plasma ignition via a patented ignition system