RF plasma generator Paramount Plus

Multi-Level Pulsing and Pulse Waveform Control for Emerging Plasma Applications Get the broadest feature set available in a pulsed-RF product. The Paramount Plus offers precise RF regulation, sophisticated pulse manipulation, and advanced data acquisition. Designed to cover an extensive range of RF energy — frequencies of 1 to 60 MHz and power levels of 1.5 to 15 kW — the Paramount Plus delivers the repeatability and reliability you require. Paramount® Plus Pulsed-RF Power Supplies With multi-level pulsing, pulse waveform control, and the broadest feature set available in a pulsed-RF product, the Paramount® Plus platform allows you to push the boundaries of process innovation and delivers the best value in the marketplace. Excellent plasma stability, precise RF regulation, sophisticated pulse manipulation, and advanced data acquisition provide the extreme latitude in plasma control required for next-generation nodes. USER BENEFITS „ Precise RF and pulse control „ Enhanced plasma stability and process repeatability „ Fast response to plasma changes „ Flexibility and adaptability for advancing manufacturing technologies SEMICONDUCTOR APPLICATIONS „ PVD „ PECVD „ Etch