Cathodic for thin-layer deposition sputtering target

We utilize a variety of specialized processing techniques such as hot pressing, hot isostatic pressing (HIP), cold isostatic pressing (CIP), induction vacuum melting, and vacuum casting to produce homogenous, fine-grained, high-density materials that conform to the strictest application standards. All sputtering targets are cleaned, inspected, chemically-tested, and packed under inert gas for immediate use in your vacuum system. Angstrom Sciences provides a full range of sputtering target materials including: precious metals, pure metals, alloys, ceramics, cermets, borides, oxides, carbides, nitrides, silicides, and fluorides. Purities range from commercial grade (99.5%) to ultra high (99.9999%).