Quadrupole spectrometer AKONIS

IMSprocessfor the semiconductor industry

Fully automated SIMS for high-volume semiconductor manufacturing The AKONIS SIMS tool fills a critical gap in semiconductor fabrication processes by providing high throughput, high precision detection for implant profiles, composition analysis and interfacial data to enable high-volume manufacturing. AKONIS provides a very high level of automation to ensure repeatability across tools for fab level process control and tool-to-tool matching. Complementing the IMS Wf/SC Ultra as well as the SIMS 4550 (quadrupole SIMS) used to support the semiconductor industry via characterization labs, AKONIS - with full automation of instrument set-up and acquisition routines - enables rapid, within-fab analysis without compromise in analytical sensitivity. AKONIS benefits from recent development in EXtremely Low Impact Energy (EXLIE) ionic column technology (< 150 eV), coupled with a full wafer handling system including a high resolution stage enabling measurements on pads down to 20 μm. The high yield enabler on N5 and beyond High resolution composition and fast dopant depth profiling of SiGe and SiP multilayer stacks Unrivalled in pad detection limits down to 20 μm More than 97% of time reduction to feedback data to the process line Blanket and patterned full wafer measurement Pattern recognition engine coupled with high resolution interferometric stage for < 2 μm position accuracy Intuitive recipe creation based on unique material database SEMI certified (S2/S8, E4, E5, E39, E84...) Low cost of ownership