Water heater PUR-X 1000

aircirculationexplosion-proof

APPLICATIONS: Semiconductor Wafer Cleaning (Wet Bench) Processes Heating of Photo-Resist Removal Solvents DI water Heating for Wafer Rinsing Air and Nitrogen Heating for Wafer Drying Heating of Acids, IPA, Piranha, NMP, etc. For Use with Single Pass or Recirculating Systems FEATURES & BENEFITS: Fluid Path has No Contact with Heating Elements Media is Isolated in PFA (Teflon®) Flow-Tube (High Purity Heating) Allows for Safe Heating of Dangerous Liquids & Gases Flow-Tube is Safe for Use with Many Caustic Solvents Flow-Tube Is Field Replaceable (No Service Call Required) Compatible with Standard Controls (PID, PLC, Multi-Loop, etc.) Body is Teflon® Coated, for Maximum Cleanliness Self-Draining Flow-Tubes, and Long-Life Heating Elements SPECIFICATIONS: Power: 1.5 kW Total to 4.5 kW Total Voltage Range: 120 - 415 V Max Line Current: 30 A per circuit Tubing: .375” OD (3/8”) (9.52 mm) .031” Wall (.80 mm) Overall Process Tube Length: 190" (4826 mm) PFA (PerFluoroAlkoxy) / Teflon® (standard) High Purity PFA (optional upgrade) Max Pressure: 70 psi (4.82 bar) Body: Aluminum with Black Teflon® Protective Coating Enclosures: NEMA 7 (explosion-proof) Max Working Temperatures: 392°F (200°C) Sensors: K or J Type Thermocouples Standard (Qty. 3) 1 for Process Control 1 for High-Limit Protection 1 for Tube Temperature Protection Available Accessories: Insulating Jackets Straight Union Fittings