CVD deposition machine C30S
thin-filmparylene

CVD deposition machine - C30S - COMELEC - thin-film / parylene
CVD deposition machine - C30S - COMELEC - thin-film / parylene
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Characteristics

Method
CVD
Deposition type
thin-film, parylene

Description

Ideal for laboratory tests and industrial production of small pieces Versatile equipment with possible upgrade to Multilayer configuration Perfectly suited for: Small and medium-sized components (e.g. in electronics, medical applications etc) Wafers up to ø 200 mm (8 inch) Overall dimensions (L x W x H) - 2100 x 1370 x 2000mm Weight - 350kg Chamber size - ∅ 295 x 370 mm Tooling size - ∅ 260 x 320 mm Max. tooling load - 100kg Dimer load capacity - 150g Pumping capacity - 40 m3/h Power supply required - 3 x 400V + N + PE – 50 Hz 3 x 25A – 15kW Parylene processable - Type: C, D, N, F-VT4, F-AF4 Thermalized chamber – temperature range - 20 – 30°C Options - Compatible with all options

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