Plasma systems from Diener electronic have long since established themselves in a wide range of industrial sectors. With the Nano low-pressure plasma system, you can rely on modern and future-proof cold plasma technology in a vacuum. The chamber volume of 18 up to 24 litres of this plasma system offers enough space to serve laboratory and also series production.
Plasma treatment in low-pressure plasma is a proven technique for controlled ultra-fine cleaning, improvement of adhesion (activation and etching) and coating of thin layers on substrate surfaces. Plasma is generated by applying high-frequency voltage in the vacuum chamber. In the process, the process gas introduced there is ionised.
Fields of application:
VOC-free cleaning of organic residues.
Activation before painting, gluing, potting, ...
Etching of PTFE, photoresist, oxide layers, ...
Super-hydrophobic and -hydrophilic coatings.
Main features:
Benchtop or floor-standing
Vacuum chambers: Stainless steel, aluminium, borosilicate or quartz glass
Chamber volume: 18 - 24 litres
Gas supply: Mass flow controllers (MFCs)
Generator frequencies: 100 kHz (0 - 500 W), 80 kHz (0 - 1000 W), 13.56 MHz (0 - 300 W), 2.45 GHz (0 - 600 W)
Controls: Semi-automatic, rotary switch, basic PC control (Windows CE), full PC control (Windows 10 IoT)
Pressure measurement: Pirani, capacitance manometer
The nano plasma systems are mainly used in the following areas:
Analytics, Archaeology, Automotive, Research and development departments, Semiconductor technology, Small batch production, Plastics technology, Medical technology, Microsystems technology, Sensor technology, Sterilisation, Textile technology.