Tubular oven TubeStarannealingpyrolysiselectric
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Characteristics
- Configuration
- tubular
- Function
- annealing, pyrolysis
- Heat source
- electric
- Atmosphere
- vacuum, controlled atmosphere, inert gas, nitrogen, hydrogen
- Other characteristics
- automatic, compact, programmable, horizontal, custom, laboratory, industrial, for the electronics industry, for printed circuit boards
- Maximum temperature
Max.: 1,200 °C
(2,192 °F)Min.: 0 °C
(32 °F)
Description
The TubeStar furnace platform is a compact batch type tube furnace. This platform is dedicated to diffusion, oxidation and deposition applications and has been designed to meet the needs of process engineering. The TubeStar range is modular and flexible. Indeed, it can be made of 1 to 4 independent tubes, with a capacity of 50 wafers per tube.
PLUS AND BENEFITS
The TubeStar furnace platform excels in the processing of small quantities of wafers, but also fits well with the treatment of large batches thanks to its flexibility. These have proven their efficiency during the qualification of process changes such as in PV manufacturing lines.
One of the key characteristics of this tube furnace lies in precision heat treatment combined with high levels of tuning flexibility. This allows a wide spectrum of applications.
POSSIBLE APPLICATIONS
Diffusion
LPCVD
Oxidation
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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.