Chamber oven +60 °C ... +300 °C | PVC, PVHC series

heat treatmentelectric

Used extensively in baking, heat treatment/drying of semiconductor wafers, liquid crystals, disks and other components and devices requiring clean air conditions. In addition to the standard instrumentation which offers two-step programming, the M-instrumentation allows programmed operation in up to 18 steps. Class 100 cleanliness is achieved by employing a HEPA filter and a back-to-front laminar circulation system. The high-performance model (PVHC model) provides stable performance even during heat-up or cooling at high temperatures of 150°C(+302°F) or more. Compatible with the chamber network, E-BUS system.