It is suitable for semiconductor and photovoltaic fields. For TOPCon process cells in the photovoltaic field, LPCVD equipment can complete the preparation of tunnel oxide layer/poly layer in one stop. The combination of thermal oxygen and poly layer deposition can greatly increase production capacity, while compatible with i/d-Poly growth process.
Main Features
Mature high-capacity process, dual-mode temperature control technology, film gauge protection technology;
With a variety of coating technologies: multi-layer composite film, doped polysilicon technology;
Patented rapid cooling furnace body: The latest patented technology makes the furnace body temperature drop to the required temperature quickly, and the cooling rate can be increased by more than 25%, which can improve the temperature uniformity in the furnace tube obviously;
Fast adaptive pressure closed-loop control technology;
MES/CCRM system with complete architecture and outstanding performance;
Integrated industrial computer + Modular process control software;
Comprehensive power failure safety treatment and abnormal protection of flange water.