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Sub-nanosecond laser NPFL-80IR-1.01
solid-statemarkingcutting

Sub-nanosecond laser - NPFL-80IR-1.01 - Han's Laser Technology Co., Ltd - solid-state / marking / cutting
Sub-nanosecond laser - NPFL-80IR-1.01 - Han's Laser Technology Co., Ltd - solid-state / marking / cutting
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Characteristics

Operational mode
sub-nanosecond
Technology
solid-state
Applications
marking, for scribing, cutting, drilling, for the glass industry, for metal, for the plastics industry, for thin-film deposition
Other characteristics
compact, adjustable
Power

80 W

Wavelength

1,064 nm

Description

1) Sub-nanosecond pulse 2) High peak energy and peak power 3) Adjustable repetition frequency 4) Near-diffraction-limited beam quality 5) Compact structure and small size Applications 1) Cutting, drilling, scribing (glass, silicon, ceramic) 2) Thin-film pattern (metal, thin film) 3) Marking (glass, silicon, ceramic, metal, plastic)
*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.