Automatic coating machine PECVD (SiNx)
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Characteristics
- Options
- automatic
Description
This machine is designed to apply the anti-reflective coating to the surface of crystalline silicon wafers to reduce reflection for its cell efficiency maximization.
Spec
High Throughput: 6,776 wafers/hr (640 wafers/boat)
Cycle Time: 34 min
Uptime: 97%
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