Cabinet furnace LP
oxidation

Cabinet furnace - LP - HANWHA MACHINERY - oxidation
Cabinet furnace - LP - HANWHA MACHINERY - oxidation
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Characteristics

Configuration
cabinet
Function
oxidation

Description

This machine is designed to improve the cell efficiency by applying a passivation layer on the front side of the silicon wafer after Edge Isolation and PSG removal. Spec High Throughput: 14,400 wafers/hr (2,400 wafers/boat) Cycle Time: 60min Uptime: 99%

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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.