Chamber furnace HCTE-VF-009annealingvacuum
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Characteristics
- Configuration
- chamber
- Function
- annealing
- Atmosphere
- vacuum
- Maximum temperature
900 °C, 1,200 °C, 1,600 °C
(1,652 °F, 2,192 °F, 2,912 °F)
Description
Application Scope:
The vacuum annealing furnace is primarily used for vacuum annealing treatment of small silicon steel laminated cores. It serves the purpose of eliminating cold-working stress in materials, repairing internal grain structure, removing impurities from the core surface, and improving the magnetic conductivity of the core.
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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.