Mass spectrometer PSM

quadrupolechemistryprocess

A mass and energy analyser for plasma diagnostics Hiden plasma probes measure some of the key plasma parameters and provide detailed information relating to plasma reaction chemistry. Plasma Characterisation Plasma Etching and ALE HiPIMS Diamond-Like Carbon (DLC) Coating Pulsed Laser Deposition (PLD) Coatings DC Magnetron Deposition of SiBCN Films A wide range of industrial processes use electrical plasmas, and new applications are developing rapidly. In the microelectronics industry the demands of higher yields and shrinking device geometries mean that process reproducibility and understanding is vital. Detailed understanding of the reaction kinetics of plasma ions and neutral species plays a key role in the development of advanced surface engineering processes such as HIPIMS. Differentially pumped manifold with mounting flange to process chamber High sensitivity / stability triple filter quadrupole, mass range options to 510amu Pulse ion counting detector with 7 decade dynamic range Energy analysis option by pole bias scanning 100eV Ion extraction / exclusion optics with tuneable integral ioniser for Appearance Potential MS Penning gauge and interlocks to provide over pressure protection Signal gating and programmable signal gating option for time resolved studies in pulsed plasma Analysis of neutrals and radicals as standard, +ve / -ve ion analysis option Mu-Metal, Radio-metal shielding options, high pressure operation options MASsoft control via RS232, RS485 or Ethernet LAN