Birefringence measuring system Exicor® DUV series

The Exicor® DUV and 193 DUV systems measure birefringence at deep ultraviolet wavelengths. The 2003 "R&D 100" award winning Exicor DUV system was developed to evaluate intrinsic birefringence in Calcium Fluoride (CaF2) lens materials at the application wavelength of 157 nm. The subsequent Exicor 193 DUV focuses on a variety of materials used in 193 nm lithographic systems, especially immersion 193 nm lithography systems that demand the highest quality optics. Both of these systems satisfy the measure at the wavelength of use principle demanded by precision optical materials manufacturers who are pushing the technology envelope. The Exicor DUV and 193DUV systems are the primary systems used by the leading lithography industryoptics manufactures to measure birefringence in lens blank materials and photo-mask blanks at DUV lithographic wavelengths (157 nm, 193 nm, 248 nm). These systems are built with a robust frame and heavy duty motion control components for measuring optics up to 400 mm X 400 mm and 200+ mm thick. The Exicor DUV system also utilizes a unique localized oxygen displacement system in the sample chamber because 157 nm UV light is absorbed by oxygen molecules. This clean dry nitrogen purged environment also prevents the generation of ozone in the DUV sample chamber. Purging is not required for 193 nm and 248 nm measurements. These systems large scanning stage also allows for loading multiple smaller parts on the stage, with the optional Exicor Macro+ software executing automated routines to scan each part individually.