Focused ion beam system NX9000

The newly developed FIB-SEM system from Hitachi, the NX9000 incorporates an optimized layout for true high-resolution serial sectioning to tackle the latest demands in 3D structural analysis and for TEM and 3DAP analyses. The NX9000 FIB-SEM system allows the highest precision in material processing for a wide range of areas relating to advanced materials, electronic devices, biological tissues, and a multitude of other applications. • The SEM column and FIB column are orthogonally arranged to optimize the column positioning for 3D structural analysis. • The combination of high-brightness cold-field-emission electron source and high-sensitivity optics support analysis of a wide range of materials from biological tissues to magnetic materials. • The Micro-sampling system and Triple Beam system allow high-quality sample preparation for TEM and atom-probe applications. Ion milling and observation at normal incidence in real-time for true analytical imaging The SEM column and FIB column are orthogonally arranged to realize normal incident SEM imaging of FIB cross sections. Orthogonal column arrangement eliminates aspect deformation, foreshortening of cross-sectional images, and shift of the field of view (FOV) during serial section imaging, which cannot be avoided by conventional FIB-SEM systems. The NX9000 images enable highly accurate 3D structural analysis. Optical correlative microscopy can be applied easily due to the benefit of surface-planar EM imaging. Cut&See Cut & See supports high-resolution, high-contrast imaging of biological tissues, semiconductors, and magnetic materials, such as steel and nickel, at low accelerating voltages.