Spectroscope EV-140C

This emission analysis type end-point monitor is intended for end-point detection or plasma condition control in the plasma-based semiconductor thin-film process. The newly-developed Rapture Intensity algorithm allows accurate end-point detection by capturing faint signal changes. The ability of capturing subtle changes in emission has significantly improved the sensitivity. The enhanced noise immunity ensures highly stable operation in hostile environments of round-the-clock manufacturing lines. Features Bright grating with opening ratio of F/2 A bright optical system is achieved by the use of a large, aberration-correcting concave grating of 70 mm in diameter manufactured by HORIBA Jobin Yvon. The light-gathering ability of the concave grating itself enables the construction of a simple optical system that is brighter than Czerny-Turner spectroscopes and that can minimize the reflection loss caused by mirrors and other reflective surfaces. Back-illuminated CCD line sensor offering high sensitivity and high resolution of 2,048 channels Back-illuminated CCD achieves high quantum efficiency, ensuring stable spectroscopy in the broad spectrum from UV to visible regions. The highly sensitive measurement possible in the UV region, in particular, enables end-point detection in the wavelength range which is less affected by interference. Sigma-P software for advanced process control This software executes a variety of steps required for process control, from the analysis of plasma behavior to the creation of databases of measured data and remote control of manufacturing equipment.