Critical semiconductor manufacturing processes continuously desire precision gas flow control devices that enable both future innovation, and lab to fab transition of leading edge memory and logic device. HORIBA's propose the new pressure based MFC D700MG, the upper compatible model of the D500MG to support customer’s challenges.
Features
On-Tool Gas and Full Scale Configuration Change *Only EtherCAT
Provide flexibility to process optimization
100ms Step-up Response & MFC-to-MFC deviation control
Deliver high productivity and greater process performance
MRMG functionality for small flow rate(Bin101 – Bin105)
Provide flexibility to process requiring small flow rate
Better Valve Shut-off and Corrosion Resistance by PFA nozzle
Robustness with less particle risk reduce down time and optimize yield
State Monitor Function
Provide more internal data for smarter failure prediction
Output items of state monitor function
Flow/Pressure zero adjustment counts
Valve drive counts
Record of max/min P0,P1,P2 pressure
Record of max/min Block temperature
Total time over/below pressure spec.
Total time over/below temperature spec.
Total working time
Total control time
Total flow time (per calibration instance)
Total flow rate (per calibration instance)