Dioxide titanium powder 12033-62-4

Tantalum Nitride (TaN) has excellent physical, chemical and mechanical properties (such as high hardness, wear resistance, chemical inertness, thermal stability and low temperature coefficient of resistance), and is widely used in wear-resistant coatings, thin film resistors and integrated circuits Diffusion barriers and other fields in China. Molecular weight: 194.9 Density:13.4g/m3 Colour:gray Melting point:3090℃ Nitrogen content:≥6.8 Boiling point:4800℃ EINECS (EC NO.)：234-788-4 Tantalum Nitride (TaN) has excellent physical, chemical and mechanical properties (such as high hardness, wear resistance, chemical inertness, thermal stability and low temperature coefficient of resistance), and is widely used in wear-resistant coatings, thin film resistors and integrated circuits Diffusion barriers and other fields in China. 1.High purity: the highest purity can reach 99.99%, XRD detect no impurity phase.