Tantalum disilicide (TaSi2) has excellent properties such as high melting point, low resistivity, corrosion resistance, high temperature oxidation resistance and good compatibility with silicon, carbon and other basic materials. It is mainly used in electrical heating elements, high temperature structural components, grid materials, integrated circuit connection lines, high temperature oxidation resistance coating, metal ceramics, ceramic matrix composites and aerospace, engine and other fields.
Molecular weight:237.12
Density:9.14g/cm3
Colour:gray
Melting point:2200ºC
Boiling point:N/A
EINECS (EC NO.):235-081-3
Tantalum disilicide (TaSi2) has excellent properties such as high melting point, low resistivity, corrosion resistance, high temperature oxidation resistance and good compatibility with silicon, carbon and other basic materials. It is mainly used in electrical heating elements, high temperature structural components, grid materials, integrated circuit connection lines, high temperature oxidation resistance coating, metal ceramics, ceramic matrix composites and aerospace, engine and other fields.
1, High purity: XRD detected no impurity phase, low gas content;
2. Concentrated distribution: particle size standard normal distribution, no bimodal or multi-modal, the particle size distribution range can be designed according to customer requirements.