Multi-sensor characterization instrument Vertex

plasmaion energy distribution

The Vertex Multi Sensor measures the ion energy distribution as a function of aspect ratio hitting a surface inside a plasma reactor from multiple locations to analyse the uniformity of ion interactions across a substrate. The uniformity of Ion energy, Ion flux and bias voltage is also measured from multiple locations. The angle of ions hitting the bottom of a feature can be determined from the ion energy distribution as a function of aspect ratio which can be measured across a substrate to monitor the uniformity and hence the quality of the etch profile from one side of the substrate to the other. The Vertex Multi Sensor measures the uniformity of the ion energy distribution as a function of aspect ratio. Ion energy uniformity, ion flux uniformity, negative ion uniformity and bias voltage at a surface inside a plasma is provided. The Vertex Multi Sensor is increasingly used in many applications in industry and research where feature profile is of interest, such as plasma etching for larger substrates, ion beams, and plasma sputtering. The Vertex Multi Sensor helps users confirm models, develop new processes and experiments that use plasma and require a uniform process, plasma tool design, plasma characterisation and research. The Vertex Multi Sensor is housed in a 19" rack mounted electronics unit, vacuum feed-through, and a sensor holder located anywhere inside a plasma or beam chamber. The location can even be a RF or DC powered electrode and can use a replaceable Button Probe sensor. The electronics unit connects to a laptop or a PC and uses the Vertex intelligent software suite.