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Large aperture positioning system XY-OF-S300x300-A300x300JXYlinearfor wafer inspection and metrology
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Characteristics
- Number of axes
- XY
- Features
- linear
- Applications
- industrial, for wafer inspection and metrology, for laboratory applications, for clean rooms, for optical applications, for wafer handling, PCB, for scanners, for testing
- Other characteristics
- compact, high-accuracy, linear motor-driven, high-resolution, servo controlled, with stepper motor, servo-driven, high-speed, large aperture, lead screw
- Repeatability
5 µm
- Load
30 kg
(66.14 lb)- Stroke
300 mm
(11.81 in)- Speed
40 mm/s, 80 mm/s
Description
Open-frame XY stages designed with a low profile for a wide range of automated accurate positioning in microscope-based applications. The drive mechanism located on the side of the unit and offers a clear unobstruced two axes aperture to enable light or objects to pass through the center of travel.
OPEN FRAME 300x300 mm APERTURE REMAINS UNOBSTRUCTED OVER THE COMPLETE STROKE OF XY STAGE
Model - Unit -
XY-OF-S300x300-A300x300J
Stroke XY - mm - 300x300
Screw lead - 4 mm -
Aperture - mm - 300x300 unobstructed over complete travel range
Table top - mm - 400x400
Height - mm 140
Backlash - micron - 5
Resolution (translated) - micron - 1
Motor NEMA17 - -
stepper, stepper/encoder, servo/encoder
Repeatability - micron - 5
Load capacity - kg - 30
Table weight - kg - 45
Max speed - mm/sec 80 with servo motor 40 with stepper motor
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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.