Acid pump FS-100HT2

pneumaticbellowsstationary

Enhanced cleaning efficiency Cleaning efficiency such as the removal of particles and metal contamination on wafers is improved as the circulation flow rate is increased. Cleaning times resulting from increased number of processing lines will also be reduced due to higher circulation rate. Contamination-free In addition to the use of fluoroplastic wet ends (PTFE and PFA), a fluorine coating on the pump’s outer surfaces offers the best resistance to vapors from acid, alkali and hydrogen peroxide chemistries used in semiconductor manufacturing. Reduced installation area In addition to the use of fluoroplastic wet ends (PTFE and PFA), a fluorine coating on the pump’s outer surfaces offers the best resistance to vapors from acid, alkali and hydrogen peroxide chemistries used in semiconductor manufacturing Weight saving Optimization of design has resultind in reduced weight of about 15% of our existing 80-100L models making installation and replacement work easier.