Spectroscopic ellipsometer iSE

The iSE is a new in-situ spectroscopic ellipsometer developed for real-time monitoring of thin film processing. Using our proven technology, the iSE enables users to optimize optical properties of deposited films, control film growth with sub-angstrom sensitivity, and monitor growth kinetics. Powerful With the power of spectroscopic ellipsometry (SE), the iSE is capable of measuring thickness and optical properties with much higher certainty than other techniques. Compact New compact design enables easy integration onto any chamber. Versatile Accurately determines thickness and optical properties for wide variety of thin films including metals, semiconductors, oxides, nitrides, and more. Affordable The power of spectroscopic ellipsometry at a reasonable price. Easy-to-Use User-friendly interface for real-time analysis of thin film growth and etch.