Laser lithography system JBX-9500FS

JBX-9500FS is a 100kV EB system that provides world-top-level throughput and positional accuracy among Spot beam lithography systems. This EB system can accommodate up to 300mmΦ wafer and up to 6-inch mask, thus responding to R&D and production in various fields, such as nanoimprint, photonic device and communication device. Features In addition to the maximum scan speed of 100MHz, JBX-9500FS achieves overlay accuracy of ±11nm, field stitching accuracy of ±10nm and positional accuracy within field of ±9nm when the field size is 1000µm×1000µm. Thus, JBX-9500FS is a 100kV EB system that provides world-top-level throughput and positional accuracy among Spot beam lithography systems. Since JBX-9500FS employs Beam positioning DAC of 20bits and Scan DAC of 14bits, higher-resolution scan step of 0.25nm is obtained for writing data increment of 1nm, thus reproducing more precise writing data. Its high scan speed up to 100MHz enables JBX-9500FS to maintain short scan steps at large-current writing, thus enhancing throughput even when high-precision pattern writing is required. World-top-class positional accuracy is achieved by LBC (laser beam control) that provides the high-resolution, minimum beam positioning step of 0.15nm (λ/4096). Furthermore, a unique auto calibration function (automatic correction function) developed by JEOL achieves highly reliable, stable pattern writing for a long period of time. Timing of auto correction can be set for each field or each pattern. This function is very effective for a long period writing without an operator, for example at weekends or consecutive holidays.