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CVD vacuum deposition service
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Description
Large-area vertical sputtering equipment
・Effective film formation range
300mm×100mm
・Equipment configuration
Vertical RAM cathode mounted sputtering chamber
・Film materia
TCO (ITO etc.) / Metals (Cu etc.) / Metal oxides (NiO etc.) / C (DLC) / Others
Exhibitions
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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.