Thickness measuring system SpectraFilm™

spectroscopicfor filmhigh-precision

Film Metrology Systems The SpectraFilm™ F1 film metrology system helps achieve strict process tolerances at sub-7nm logic and leading-edge memory design nodes by providing high-precision thin film measurements for a broad range of film layers. The high brightness light source drives the spectroscopic ellipsometry technology which provides the signal required to accurately measure the bandgap and provide insight into electrical performance weeks earlier than e-test. New FoG™ (Films on Grating) algorithms further increase the measurement’s correlation to device by enabling film measurement on a device-like grating structure. With increased throughput, SpectraFilm F1 offers high productivity, supporting the increased number of film layers associated with leading-edge device fabrication techniques. Applications Bandgap monitoring, Engineering analysis, Inline process monitor, Tool monitor, Process tool matching Related Products SpectraFilm LD10 The SpectraFilm™ LD10 film metrology system provides reliable, high-precision measurements of thin and thick film thickness, refractive index and stress for a broad range of film layers at the 16nm design node and beyond.