Temperature measurement system WetTemp series

for wafers

In Situ Wet Processing Wafer Temperature (15° to 140°C) Measurement System The WetTemp in situ wafer temperature measurement system, available in both 300mm and 200mm configurations, supports monitoring of wet clean and other wet processes. The WetTemp series monitor wafers are compatible with most single wafer wet clean process systems to help engineers qualify wet clean tools, optimize wet clean processes and drive improvements in wet clean system performance. Applications Process development, Process qualification, Process tool monitoring, Process tool qualification, Process tool matching WetTemp-HR Wafer temperature monitoring with 65 integrated temperature sensors uniformly distributed in nine concentric rings to provide improved wafer surface coverage for rich spatial temperature data across the wafer. Compatible with single wafer wet processes with a wafer thickness of 1.2mm. WetTemp-LP Wafer temperature monitoring with 65 integrated temperature sensors distributed in five concentric rings with biased density in the 147mm area. Compatible with single wafer wet processes with a wafer thickness of 0.775mm. WetTemp Wafer temperature monitoring with 65 integrated temperature sensors distributed in five concentric rings with biased density in the 147mm area. Compatible with single wafer wet processes with a wafer thickness of 1.2mm.