Wafer etching machine Primaxx® Monarch 3

The Primaxx® Monarch 3 vapor hydrogen fluoride (VHF) etch system is designed to perform selective etch release via a controlled anhydrous HF/alcohol etch process. The Monarch 3 is a compact module includes a 3-wafer process chamber including a semi-automatic 3-wafer loader with load lock, and is designed for research laboratories and small volume production environments. An integrated panel PC, with on-board electronics minimizes cleanroom footprint and the system has been designed for easy wafer size changes and maintenance. • Compatible with 100mm-200mm wafers • Batch size up to 3 wafers • Standalone system • Small footprint includes process chamber, gas/liquid panel and pressure/vacuum components