Surface defect inspection system Teron™ 6xx series

for production

Reticle Defect Inspection Systems for Mask Shop Applications The Teron™ 640e reticle inspection product line advances the development and qualification of leading-edge EUV and 193nm patterned reticles in mask shops by detecting critical pattern and particle defects. Using die-to-database or die-to-die modes, these inspection systems are designed to handle the wide range of stack materials and complex OPC structures characteristic of the latest 7nm and 5nm device nodes. The Teron 640e incorporates several optics and image processing enhancements that support the defect capture specifications and throughput required to accelerate reticle manufacturing cycle times. The Teron 640e product line also achieves the stringent cleanliness requirements necessary for production of EUV masks. Applications Reticle qualification, Reticle process control, Reticle process equipment monitoring, Outgoing reticle quality check Related Products Teron 640: Industry production standard for inspection of optical and EUV reticles at the 10nm node and beyond. Teron 630: Industry production standard for inspection of 1Xnm / 2XHP optical and EUV reticles. Teron 610: Industry production standard for inspection of 2Xnm / 3XHP optical reticles. TeraScan™ 500XR: Industry production standard for inspection of 3Xnm / 4XHP optical reticles.