Reticle Blank Defect Inspection Systems
The FlashScan® 211 mask blank defect inspection system supports mask shops and blank manufacturers in meeting mask blank defect requirements for optical and EUV lithography applications. The FlashScan 211 system pairs its high sensitivity with unparalleled inspection speed and automatic defect dispositioning, reducing the time to results for a wide range of applications.
Applications
Mask blank manufacturing, Mask blank qualification, Reticle process control, Reticle process equipment monitoring