Cabinet furnace VF-5300

heat treatmentannealingoxidation

This vertical furnace with a built-in stocker processes 8-inch wafers at ultra-high temperatures in large batches. This furnace is a semiconductor heat treatment system that can perform oxidation, diffusion, LPCVD, activation annealing and various other heat treatments. Features Large batch, max 150 wafers batch processing Max 20 cassette stocks Excellent temperature control from low to medium high temperature range using an LGO heater High-speed wafer transfer by use of single/five wafers handling robot Equipped with an operator-friendly high performance control system This model is a continuous large-batch, mass-production type vertical diffusion furnace equipped with a stocker for a maximum of 150 wafers (8-inch) or 20 cassettes. Thanks to the LGO heater, this furnace exhibits superior temperature characteristics over a range from low temperatures to ultra-high temperatures. This furnace can be used for a wide range of processing from low-temperature annealing, nitride (Si3N4), polysilicon (poly Si) and other material LPCVD to oxidation and diffusion. A molybdenum disilicide (MoSi2) heater can also be used to support SiC power device gate oxynitriding and other ultra-high temperature processing.