Chamber oven CLH series

curingagingannealing

A heat-resistant, high-performance filter and our unique cooling unit enable high-temperature baking in a clean environment (max. 530°C (max. 500°C for the V model)). The hot-air circulation system allows excellent temperature uniformity and class 100 air cleanliness (when the temperature is stable). This type of oven is optimal for semiconductor wafer and glass substrate baking, as well as aging and other heat treatments that require high temperature and high accuracy. Heat treatments at 20 ppm or lower residual O2 concentrations is available by introducing nitrogen (N2) gas into the chamber. Features A heat-resistant high-performance filter and our unique cooling unit are installed to enable high-temperature baking. The chamber interior can maintain class 100 cleanliness when the temperature is stable. There are two hot-air blower types: a front side blower with horizontal circulation (type V) and a side blower (type III). Both enable high thermal efficiency and good temperature uniformity. Optimal for semiconductor wafer and glass substrate baking, aging and other heat treatments that require high accuracy. Inert gases can be introduced into the chambers to use the ovens as inert gas ovens.