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PVD deposition machine PVD 75
sputteringthermal evaporationvacuum

PVD deposition machine
PVD deposition machine
PVD deposition machine
PVD deposition machine
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Characteristics

Method
PVD
Technology
sputtering, thermal evaporation
Other characteristics
vacuum

Description

PRO Line PVD Series – Versatile Sputtering, Electron Beam, Thermal, & Organic Evaporation Deposition Platform The PRO Line PVD Series utilizes a modular design configurable for a variety of thin film deposition applications. Available in three increasing chamber sizes: PVD75, PVD200, and PVD500 Available with TORUS® Mag Keeper™ UHV Compatible Circular Magnetron Sputtering Sources in 2", 3", 4" diameters Available with TORUS® Linear Magnetrons Available with Multi-pocket electron beam evaporation sources Available with multiple thermal evaporation source configurations Up to two organic evaporation sources available Multi-technique options available. Examples: Electron beam + Sputtering, Electron beam + evaporation Wet or dry rough pumping, turbo pump, or cryogenic pump high vacuum pumping options available Standard configurations compatible with up to 11" to 20" OD substrates (pending chamber size); up to 850°C heating, cooling, and biasing options available Single and multi-wafer load lock options available for substrates up to 6" PRO Line series of PVD tools include KJLC's innovative eKLipse™ advanced control package
*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.