Magnetron sputtering machine VTC-600-2HD DC/RF

for metallization

VTC-600-2HD is a magnetron sputtering system featuring dual target sources: 1) DC source for coating metallic material on one head and 2) RF source for coating non-metallic material on the other head. It is equipped with a film thickness tracker to enable the user to easily monitor the coating progress and also record the data. This model is sophsticatedly designed for coating single or multiple film layers of a wide range of substrate materials (ferroelectric, condutive, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard, PTFE and etc). Its compactness and ease of operation make it an ideal coating system for use in R&D labs. Input Power • 220VAC 50/60Hz, single phase • 2000W (including pump) Source Power • Two sputtering power sources are integrated into one control box • DC source: 500W for coating metallic materials • RF source: 600W with automatching for coating non-metallic materials • Compact 300 RF source is available at extra cost Magnetron Sputtering Head • Two 2" Magnetron Sputtering Heads with water cooling jackets are included ( click picture-left to see detailed specs ) • One is connected to RF power supply for no-conductive materials • Another is connected to DC sputtering power source for coating metallic materials • Target size requirement: 2" diameter • 1/16" max. thickness for metallic targets • 1/4" max. thickness for no-conductive targets • One stainless steel and one Al2O3 ceramic targets are included for demo testing