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Wafer spin coater VTC-200P

wafer spin coater
wafer spin coater
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Description

Vtc-200p vacuum rotary coating machine is suitable for surface coating process of semiconductor, crystal, optical disc, plate making, etc. This machine can be used for coating preparation of strong acid and strong alkaline coating solution. The cavity of vtc-200p vacuum rotary coating machine can't be vacuumized. When it works, the sample is fixed on the sample tray by the way of vacuum tray adsorption. The equipment can store 12 groups of programs, each group of programs includes 6 operation stages. In different operation stages, the number of revolutions of the equipment is different, so that the speed of the equipment is slowly increased to the limit speed, which is conducive to the uniform film formation of the film material on the sample surface, without excessive waste and material saving. The upper cover of the chamber can heat the sample (optional function), which is conducive to the coating process of the film material with high viscosity. Vtc-200p vacuum rotary coating machine has the advantages of simple operation, convenient cleaning, compact size, etc., which is mainly used in the laboratory of colleges and universities, scientific research institutes to generate films. Main features : 1. There are 12 groups of programs, each group includes 6 operation stages, the setting range of increase and decrease rate of each section is 100-2000rpm / s, and the time range of each section is 0-60s. 2. The sample is fixed by vacuum adsorption, which is easy to operate. 3. The vacuum degree of suction cup can reach -0.08mpa. 4. Using the positioning tool, the sample can be easily placed in the center position to reduce the vibration or flyer caused by eccentricity.

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