Lamp illumination
UVcompactfor microscopy

Lamp illumination - Leistungselektronik JENA GmbH - UV / compact / for microscopy
Lamp illumination - Leistungselektronik JENA GmbH - UV / compact / for microscopy
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Characteristics

Illumination technology
lamp
Spectrum
UV
Other characteristics
compact
Technical applications
for microscopy, inspection
Wavelength

Max.: 1,000 nm

Min.: 250 nm

Description

Hg-Xe mixed gas discharge lighting consisting of lamp house with integrated ignition and ballast. With LEJ Deep UV lighting system, you will get extremely stable UV radiation due to the low thermal drift and very stable DC power supply from our ballast. - Furthermore, our system enables a reproducible mechanical adjustment of lamp, mirror and collector. Thus, the LEJ Deep-UV system is suitable for wafer inspection or for illumination during optical review and analysis of photomasks, especially of structures and linewidths for defects and flaws. Product Highlights no thermal drift reproducible mechanical adjustment Integrated high voltage ignition Safety circuit function Operating hours counter Application areas Photomask analysis Disinfection UV curing

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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.