Chamber furnace IT-GRV-330/350/2300
tubularsublimationcrystal growth

chamber furnace
chamber furnace
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Characteristics

Configuration
chamber, tubular
Function
sublimation, crystal growth
Heat source
induction
Atmosphere
vacuum, controlled atmosphere
Other characteristics
pressure
Maximum temperature

2,300 °C
(4,172 °F)

Description

crystal growing For Physical Vapour Transport (PVT) growth of bulk SiC single crystals after the modified Lely method Other application could be: Synthesis of high-purity SiC raw material PRODUCT SPECIFICATIONS Most important characteristics Induction furnace, top-loader design 4” SiC bulk crystal growth MF heating power 30 kW Working frequency 8-10 kHz Processing gases Nitrogen, Argon, Hydrogen, partial pressure operation 5 – 950 mbar Vacuum/gastight chamber by water-cooled double-glass tube setup Vacuum pump system for vacuum 2 x 10-5 mbar with turbomolecular pump (685 l/s) High-purity graphite felt insulation (halogen-purified) We make it possible: Linn High Therm is specialized in adapting its products to customer’s requirements. Please let us know if you need any modifications. We will do everything to satisfy your wishes. Possible standardized options Crucible rotation and displacement Crucible bottom pyrometer Emergency water cooling Process Guiding Software Bottom-loader design Circulation cooling unit Crystal growth training by renowned German research institute

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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.