This system is for 2D full angle reflection measurement, incuding the surface analysis of samples or the film's specular reflectance which promote the capability of automatic measurement on multiangle scattering and its dependency of wavelength. This system also can be applied in surface reflectance measurement, surface roughness, and film thick-
ness analysis, etc. With the design of rotating platform to expand in 3D full angle reflection and diffuse measurement system or reflection, transmission, and absorbance system which usually be applied in semiconductor, 2D or 30 material, photoconductor, solar energy, LED,
panel. coating and relative industries.
Features
- Measurable spectral range: 380~1100nm, 280~1050nm, 900~1600nm
- Automatic calibration function
- Reflectance measurement of single incident and reflection angle by program control
- Reflectance scanning measurement of single incident and reflection angle range by program contro}
- Reflectance scanning measurement of specific incident and reflection angle range by program control
- Measure and analysis of reflection / diffuse ratio measurement dependence on wavelength
- Conducting film thickness calculation of single layer
- Database record for history tracing
- The system can be expanded to measure the transmission and absorbance
- With the rotating platform to measure 3D full-angle reflection and diffuse reflection curve
Application in other field:
- Spectrum measurement of meta-material sample under different polarization
- Spectrum measurement of the angle dependence on anisotropy film or crystalline sample