XRD diffractometer Wafer XRD 300
laboratory

XRD diffractometer - Wafer XRD 300 - Malvern Panalytical - laboratory
XRD diffractometer - Wafer XRD 300 - Malvern Panalytical - laboratory
XRD diffractometer - Wafer XRD 300 - Malvern Panalytical - laboratory - image - 2
XRD diffractometer - Wafer XRD 300 - Malvern Panalytical - laboratory - image - 3
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Characteristics

Type
XRD
Applications
laboratory

Description

Your integratable wafer orientation solution The power of your factory automation meets our next-generation X-ray diffraction technology. Wafer XRD 300 is an ultra-fast, high-precision metrology module for crystal orientation and wafer geometry control. Meet the Wafer XRD 300: your high-speed X-ray diffraction module for 300mm wafer production providing key data on a variety of essential parameters such as crystal orientation and geometric features like notches, flats and much more – designed to fit seamlessly into your process line. Features and Benefits Ultra-fast precision with our proprietary scan technology The used method requires only one rotational scan to gather all the necessary data to fully determine the crystal orientation, which delivers high precision at a very low measuring time – in the range of a few seconds. Fully automated handling and sorting Wafer XRD 300 is designed to maximize your throughput and productivity. Full integration into your handling and sorting automation, makes it a powerful and efficient addition to your process. Fully automated handling and sorting Easy connectivity Wafer XRD 300’s powerful automation fits easily into your new or existing process, as it is compatible with both MES and SECS/GEM interfaces. High precision, deeper insight Understand your materials like never before with Wafer XRD 300’s key measurements including: Crystal orientation Notch position, depth, and opening angle Diameter Flat position and length Further sensors available on request The typical standard deviation tilt (example: Si 100) for the Azimuthal-scan is <0.003o.

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