- Power Transmission - Mechanical components
- Actuator and Positioning System
- XY positioning system
- Materials Research Furnaces
XY positioning system rotarylaservacuum
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Characteristics
- Number of axes
- XY
- Features
- rotary, laser
- Applications
- vacuum, for the semiconductor industry
- Other characteristics
- servo controlled
Description
8 Station Semi-conductor Wafer Indexer
This system was designed specifically for ion-beam processing of 2″ or 3″ semi-conductor wafers at elevated temperatures. It consists of a tabletop furnace with a high precision DC power supply and indexing system.The indexing system allows precise control of the wafer position and permits batch processing of 8 wafers per run. The wafers are rotated to the heater and will be heated up in a matter of seconds before the ion-beam processing can commence. Temperature is controlled by an optical pyrometer reading the surface temperature of the heated wafer. A large access port allows attachment of the ion beam instrumentation. The furnace is a complete turn key system with a vacuum system, inert gas system, indexing servo controls , temperature controls and water cooling.
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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.