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Magnetron sputtering deposition machine MINIvapthermal evaporationion beam-assistedthin-film
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Characteristics
- Technology
- magnetron sputtering, thermal evaporation, ion beam-assisted
- Deposition type
- thin-film
- Other characteristics
- vacuum
- Applications
- for the microelectronics industry, for photovoltaic applications
Description
Can be integrated in existing MBRAUN gloveboxes (through antechamber)
• For substrates up to 50 x 50 mm wafers
• Compact design
• Economic solution
• Short delivery time
• Fast and easy installation
• Easy retrofit in existing gloveboxes
• OLEDs/Organic Electronics
• OPVs
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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.