Magnetron sputtering deposition machine PROvap

thermal evaporationion beam-assistedthin-film

• Glovebox integrated system • Compact and cost-effective solution • Easy configuration design • Co-deposition • Uniformity up to +/-3 % (with specific geometry design up to +/1 %) • Two standard-sizes: PROvap 4G and PROvap 5G • Up to 8 deposition sources possible • Substrate size up to 100x100 mm or diam. 100 mm (4”) for PROvap 4G • Substrate size up to 150x150 mm or diam. 150 mm (6”) for PROvap 5G • OLEDs/Organic Electronics • OPVs • Batteries