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PVD deposition machine MINIPEROvapmagnetron sputteringthermal evaporationion beam-assisted
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Characteristics
- Method
- PVD
- Technology
- magnetron sputtering, thermal evaporation, ion beam-assisted
- Deposition type
- thin-film
- Other characteristics
- vacuum
- Applications
- for the microelectronics industry, for photovoltaic applications
Description
Mini PVD Chamber 100% dedicated to Perovskites
• Can be integrated in existing MBRAUN gloveboxes (through antechamber)
• Compact design
• For substrates up to 50x50 mm
• Up to 4 sources
• Layer uniformity < +/-5 %
• Economic solution
• Short delivery time
• Easy retrofit in existing gloveboxes
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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.