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Magnetron sputtering deposition machine PEROvapthermal evaporationion beam-assistedthin-film
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Characteristics
- Technology
- magnetron sputtering, thermal evaporation, ion beam-assisted
- Deposition type
- thin-film
- Other characteristics
- vacuum
- Applications
- for the microelectronics industry, for photovoltaic applications
Description
Specially designed for Perovskites
• Ideal tool for efficient R&D
• Special system design
• Special precursor source
• High stability at low temperature
• Stable and defined deposition process
• High vacuum conditions
• Low cross-talk
• High repeatability
• Material compatibility for a very long lifetime
• Patent pending
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*Prices are pre-tax. They exclude delivery charges and customs duties and do not include additional charges for installation or activation options. Prices are indicative only and may vary by country, with changes to the cost of raw materials and exchange rates.